Shotaro Takeuchi
Saitama Medical University Hospital(JP)The University of Osaka(JP)
Publications by Year
Research Areas
Semiconductor materials and devices, Photonic and Optical Devices, Advancements in Semiconductor Devices and Circuit Design, GaN-based semiconductor devices and materials, Nanowire Synthesis and Applications
Most-Cited Works
- → Growth of highly strain-relaxed Ge1−xSnx/virtual Ge by a Sn precipitation controlled compositionally step-graded method(2008)122 cited
- → Characterization of GeSn materials for future Ge pMOSFETs source/drain stressors(2010)105 cited
- → Mobility Behavior of Ge1-xSnxLayers Grown on Silicon-on-Insulator Substrates(2010)98 cited
- → High Quality Ge Virtual Substrates on Si Wafers with Standard STI Patterning(2009)86 cited
- → Phonon transport control by nanoarchitecture including epitaxial Ge nanodots for Si-based thermoelectric materials(2015)78 cited
- → Growth and structure evaluation of strain-relaxed Ge1−xSnxbuffer layers grown on various types of substrates(2006)74 cited