Keren J. Kanarik
Lam Research (United States)(US)
Publications by Year
Research Areas
Semiconductor materials and devices, Plasma Diagnostics and Applications, Electronic and Structural Properties of Oxides, Advanced Memory and Neural Computing, Advancements in Semiconductor Devices and Circuit Design
Most-Cited Works
- → Overview of atomic layer etching in the semiconductor industry(2015)586 cited
- → Atomic Layer Etching: Rethinking the Art of Etch(2018)218 cited
- → The grand challenges of plasma etching: a manufacturing perspective(2014)174 cited
- → Predicting synergy in atomic layer etching(2017)121 cited
- → Future of plasma etching for microelectronics: Challenges and opportunities(2024)115 cited
- → Human–machine collaboration for improving semiconductor process development(2023)106 cited
- → Atomic layer etching of GaN and AlGaN using directional plasma-enhanced approach(2017)73 cited
- → Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactions(2017)65 cited
- → Highly Selective Directional Atomic Layer Etching of Silicon(2015)47 cited
- → Inside the mysterious world of plasma: A process engineer’s perspective(2020)37 cited