Sebastian Engelmann
Publications by Year
Research Areas
Semiconductor materials and devices, Plasma Diagnostics and Applications, Photonic and Optical Devices, Advancements in Semiconductor Devices and Circuit Design, Semiconductor Lasers and Optical Devices
Most-Cited Works
- → Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma(2013)193 cited
- → Experimental realization of deep-subwavelength confinement in dielectric optical resonators(2018)181 cited
- → Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication(2014)154 cited
- → Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma(2015)104 cited
- → Density scaling with gate-all-around silicon nanowire MOSFETs for the 10 nm node and beyond(2013)97 cited
- → A Novel Approach to Photonic Packaging Leveraging Existing High-Throughput Microelectronic Facilities(2016)94 cited
- → Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193nm photoresist roughening and degradation(2008)69 cited
- → Plasma-surface interactions of model polymers for advanced photoresists using C4F8∕Ar discharges and energetic ion beams(2007)68 cited
- → Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma(2009)68 cited
- → Integrated Metamaterial Interfaces for Self-Aligned Fiber-to-Chip Coupling in Volume Manufacturing(2018)66 cited