Nathan Stafford
Air Liquide (United States)(US)
Publications by Year
Research Areas
Semiconductor materials and devices, Copper Interconnects and Reliability, Plasma Diagnostics and Applications, Catalytic Processes in Materials Science, Advancements in Semiconductor Devices and Circuit Design
Most-Cited Works
- → Electrochemical preparation of chitosan/hydroxyapatite composite coatings on titanium substrates(2003)168 cited
- → Future of plasma etching for microelectronics: Challenges and opportunities(2024)115 cited
- → Atomic Layer Deposition of Rare-earth Oxide Thin Films for High-k Dielectric Applications(2009)13 cited
- → Advances in low GWP etch gasses(2023)3 cited
- → Green chemistry for SiN etch(2024)2 cited
- → Measurement of mean ionic activity coefficients for tetra-n-butyl ammonium salts of PF 6 − and [B(C6F5)4]− in tetrahydrofuran and acetonitrile(2008)1 cited
- → A Sedimentologic, Morphometric, and Geochronologic Investigation of Ambiguous Dune-like Landforms: An Indicator of Proglacial Lake Drainage in the Lake Superior Basin, USA(2024)
- Nonaqueous electrochemical thermodynamics(2006)
- → Ultrahigh selective etching of Si3N4 over SiO2 using plasma-less dry process for 3D-NAND device applications(2019)