Hilbert van Loo
ASML (Netherlands)(NL)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques, Integrated Circuits and Semiconductor Failure Analysis, Advanced Memory and Neural Computing, Optical Coatings and Gratings
Most-Cited Works
- → Temperature-resilient solid-state organic artificial synapses for neuromorphic computing(2020)226 cited
- → Synaptic Plasticity in Semiconducting Single‐Walled Carbon Nanotubes Transistors(2020)11 cited
- → Measurement of image fading impact on 20P40 contact hole LCDU(2023)2 cited
- → LCDU decomposition and scaling: mask and resist effects on local MEEF and stochastics(2024)1 cited
- → High-NA EUV imaging in action: tackling the depth-of-focus challenge for superior resolution and LCDU(2025)1 cited
- → High NA EUV has arrived, what are the upcoming challenges?(2025)
- → Enhancing CS-MRI Reconstruction Using Improved ESSGAN with Convolutional Block Attention Module(2024)
- → 0.55NA EUV contact hole process optimization to enhance depth of focus(2026)
- → High-NA imaging performance, a year of learnings after first light on wafer(2025)