Eelco van Setten
ASML (Netherlands)(NL)ASML (Netherlands)(NL)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis, Electron and X-Ray Spectroscopy Techniques, Advanced Surface Polishing Techniques, Optical Coatings and Gratings
Most-Cited Works
- → ASML's NXE platform performance and volume introduction(2013)70 cited
- → The future of EUV lithography: enabling Moore's Law in the next decade(2017)61 cited
- → High-NA EUV lithography exposure tool: program progress(2020)58 cited
- → Epitaxial growth of oxides with pulsed laser interval deposition(2000)55 cited
- → High NA EUV lithography: Next step in EUV imaging(2019)54 cited
- → High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond(2017)54 cited
- → Performance overview and outlook of EUV lithography systems(2015)52 cited