Arpan P. Mahorowala
Lam Research (United States)(US)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Semiconductor materials and devices, Advanced Surface Polishing Techniques, Plasma Diagnostics and Applications, Copper Interconnects and Reliability
Most-Cited Works
- → Plasma-surface kinetics and feature profile evolution in chlorine etching of polysilicon(1998)111 cited
- → Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes(2004)86 cited
- → Etching of polysilicon in inductively coupled Cl2 and HBr discharges. II. Simulation of profile evolution using cellular representation of feature composition and Monte Carlo computation of flux and surface kinetics(2002)78 cited
- → Etching of polysilicon in inductively coupled Cl2 and HBr discharges. III. Photoresist mask faceting, sidewall deposition, and microtrenching(2002)42 cited
- → Line edge roughness reduction by plasma curing photoresists(2005)41 cited
- → Recent progress in electron-beam resists for advanced mask-making(2001)40 cited
- → Brillouin scattering studies of polymeric nanostructures *(2004)37 cited
- → Development of 157 nm positive resists(2001)33 cited
- → Etching of polysilicon in inductively coupled Cl2 and HBr discharges. I. Experimental characterization of polysilicon profiles(2002)31 cited
- → Hardmask technology for sub-100 nm lithographic imaging(2003)27 cited