Toshiyuki Yokosuka
Hitachi (Japan)(JP)
Publications by Year
Research Areas
Advanced Surface Polishing Techniques, Electron and X-Ray Spectroscopy Techniques, Metal and Thin Film Mechanics, Integrated Circuits and Semiconductor Failure Analysis, Semiconductor materials and devices
Most-Cited Works
- → A Quantum Molecular Dynamics Simulation Study of the Initial Hydrolysis Step in Sol−Gel Process(2003)115 cited
- → Development of New Tight-Binding Molecular Dynamics Program to Simulate Chemical-Mechanical Polishing Processes(2002)38 cited
- → Quantum Chemical Molecular Dynamics Simulation of the Plasma Etching Processes(2003)37 cited
- → Quantum Chemical Molecular Dynamics Studies on the Chemical Mechanical Polishing Process of Cu Surface(2003)21 cited
- → The development of computational chemistry approach to predict the viscosity of lubricants(2003)20 cited
- → Detection of potential ion suppression for peptide analysis in nanoflow liquid chromatography/mass spectrometry(2007)19 cited
- → ‘Information‐Based‐Acquisition’ (IBA) technique with an ion‐trap/time‐of‐flight mass spectrometer for high‐throughput and reliable protein profiling(2006)18 cited
- → Computational methods for the design of zeolitic materials(2002)14 cited
- → A Theoretical Study on the Realistic Low Concentration Doping in Silicon Semiconductors by Accelerated Quantum Chemical Molecular Dynamics Method(2003)11 cited
- → Electrostatic potential distribution characteristics of glass surfaces in vacuums(2008)5 cited