Hideo Ohtsuki
Publications by Year
Research Areas
Semiconductor materials and devices, Plasma Diagnostics and Applications, Optical Coatings and Gratings, Photonic and Optical Devices, Silicon Nanostructures and Photoluminescence
Most-Cited Works
- → Vertical and Smooth Etching of InP by Cl2/Xe Inductively Coupled Plasma(1999)52 cited
- → Highly angular dependent high-contrast grating mirror and its application for transverse-mode control of VCSELs(2014)38 cited
- → Mass Effect of Etching Gases in Vertical and Smooth Dry Etching of InP(2001)20 cited
- → Plasma Diagnostics in Inductively Coupled Plasma Etching Using Cl2/Xe(2000)16 cited
- → Iodine Solid Source Inductively Coupled Plasma Etching of InP(2005)14 cited
- → Emission Spectrochemical Analysis in Dry Etching Process of InP by Cl2 Inductively Coupled Plasma(2000)13 cited
- → Low-Temperature Dry Etching of InP by Inductively Coupled Plasma Using HI/Cl2(2003)12 cited
- → Generation of Solid-Source H2O Plasma and Its Application to Dry Etching of CaF2(2008)12 cited
- → Smooth and Vertical Profile Dry Etching of Si Using XeF2 Plasma(2009)11 cited
- → Solid Source Dry Etching Process for GaAs and InP(2006)8 cited