Hiroyasu Iimori
Toshiba (Japan)(JP)
Publications by Year
Research Areas
Advanced Surface Polishing Techniques, Surface Modification and Superhydrophobicity, Thin-Film Transistor Technologies, 3D IC and TSV technologies, Advanced MEMS and NEMS Technologies
Most-Cited Works
- → High Photovoltage Generation at Minority-Carrier Controlled n-Si/p-CuI Heterojunction with Morphologically Soft CuI(2008)32 cited
- → Effect of Surface Energy Reduction for Nano-Structure Stiction(2015)9 cited
- → Nano-Structures Stiction Suppression by Molecular Structure Optimized Surface Energy Reduction Agent(2017)5 cited
- → Fixed Charge Control of Silylated Surface for Stiction-Free Drying with Surface Energy Reduction Process(2018)