Kenneth W. Leffew
Publications by Year
Research Areas
Advanced Control Systems Optimization, Advancements in Photolithography Techniques, Nanofabrication and Lithography Techniques, Integrated Circuits and Semiconductor Failure Analysis, Microfluidic and Capillary Electrophoresis Applications
Most-Cited Works
- → Control of Polymerization Reactors(2017)58 cited
- → Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm(2003)38 cited
- → Advanced process control for injection molding(1991)26 cited
- → New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm(2006)25 cited
- → Polytrimethylene Terephthalate: An Example of an Industrial Polymer Platform Development in China(2015)20 cited
- → Bis(fluoroalcohol) Monomers and Polymers: Improved Transparency Fluoropolymer Photoresists for Semiconductor Photolithography at 157 nm(2006)19 cited
- → A Simulation Study on the Use of a Dead-Time Compensation Algorithm for Closed-Loop Conversion Control of Continuous Emulsion Polymerization Reactors(1981)14 cited
- → Fluoropolymers for 157 nm Lithography: Performance of Single Layer Resists.(2002)11 cited
- → Single layer fluropolymer resists for 157-nm lithography(2003)7 cited
- → The Impact of Fluoropolymers on Line Edge Roughness in 193nm Imaging(2005)4 cited