Jun Yashima
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis, Advanced Surface Polishing Techniques, Electron and X-Ray Spectroscopy Techniques, Particle physics theoretical and experimental studies
Most-Cited Works
- → EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond(2014)17 cited
- → Global Critical Dimension Correction: I. Fogging Effect Correction(2007)15 cited
- → Electron beam mask writer EBM-9500 for logic 7nm node generation(2016)13 cited
- → Study of heating effect on CAR in electron beam mask writing(2007)11 cited
- → Electron-beam mask writer EBM-6000 for 45 nm HP node(2007)9 cited
- → Global Critical Dimension Correction: II(2007)7 cited
- → Study on modeling of resist heating effect correction in EB mask writer EBM-9000(2015)6 cited
- → High-accuracy correction of critical dimension errors appearing in large-scale integration fabrication processes(2008)5 cited
- → A deep learning mask analysis toolset using mask SEM digital twins(2020)5 cited