Raymond Hung
Applied Materials (Singapore)(SG)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Semiconductor materials and devices, Copper Interconnects and Reliability, Nanofabrication and Lithography Techniques, 3D IC and TSV technologies
Most-Cited Works
- → Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes: Synthesis, Polymerization, and Initial Imaging Results(2002)54 cited
- → Metal-Catalyzed Addition Polymers for 157 nm Resist Applications. Synthesis and Polymerization of Partially Fluorinated, Ester-Functionalized Tricyclo[4.2.1.02,5]non-7-enes(2003)53 cited
- → Sidewall spacer quadruple patterning for 15nm half-pitch(2011)44 cited
- → 157 nm Resist Materials: A Progress Report.(2000)40 cited
- → A New Synthetic Route to Authentic N-Substituted Aminomaleimides(2005)31 cited
- → 157 nm resist materials: Progress report(2000)29 cited
- → Self-aligned triple patterning for continuous IC scaling to half-pitch 15nm(2011)27 cited
- → Development of SSQ Based 157 nm Photoresist.(2002)25 cited
- → Resist materials for 157-nm microlithography: an update(2001)24 cited
- → Polymers for 157-nm photoresist applications: a progress report(2000)23 cited