Christopher J. Progler
Photronics (United States)(US)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis, Electron and X-Ray Spectroscopy Techniques, 3D IC and TSV technologies, Industrial Vision Systems and Defect Detection
Most-Cited Works
- → Nanoimprinting Techniques for Large-Area Three-Dimensional Negative Index Metamaterials with Operation in the Visible and Telecom Bands(2014)60 cited
- → Illuminator design for the printing of regular contact patterns(1998)29 cited
- → Scattered light: the increasing problem for 193-nm exposure tools and beyond(2001)28 cited
- → Optical lens specifications from the user's perspective(1998)25 cited
- → Materials Selections and Growth Conditions for Large‐Area, Multilayered, Visible Negative Index Metamaterials Formed by Nanotransfer Printing(2013)24 cited
- → Zernike coefficients: are they really enough?(2000)21 cited
- → Cost effective lithography approaches for ASIC circuits(2003)19 cited
- → Pupil illumination: in-situ measurement of partial coherence(1998)16 cited
- → Potential causes of across field CD variation(1997)15 cited
- → Impact of lithography variability on statistical timing behavior(2004)12 cited