Senajith Rekawa
Lawrence Berkeley National Laboratory(US)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Advanced X-ray Imaging Techniques, Electron and X-Ray Spectroscopy Techniques, Optical measurement and interference techniques, Integrated Circuits and Semiconductor Failure Analysis
Most-Cited Works
- → Demonstration of 12 nm Resolution Fresnel Zone Plate Lens based Soft X-ray Microscopy(2009)277 cited
- → Hartmann wave-front measurement at 134 nm with λ_EUV/120 accuracy(2003)92 cited
- → Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic(2004)69 cited
- → Commissioning an EUV mask microscope for lithography generations reaching 8 nm(2013)45 cited
- → Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography(2003)45 cited
- → At-wavelength alignment and testing of the 0.3 NA MET optic(2004)34 cited
- → Hydrogen silsesquioxane double patterning process for 12nm resolution x-ray zone plates(2009)32 cited
- → Performance of actinic EUVL mask imaging using a zoneplate microscope(2007)30 cited
- → Actinic mask imaging: recent results and future directions from the SHARP EUV microscope(2014)24 cited
- → The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm(2012)22 cited