Yaichiro Watakabe
Mitsubishi Electric (Japan)(JP)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques, Integrated Circuits and Semiconductor Failure Analysis, Semiconductor materials and devices, Advanced Surface Polishing Techniques
Most-Cited Works
- → Focused ion beam lithography and its application to submicron devices(1986)40 cited
- → Characteristics of submicron patterns fabricated by gallium focused-ion-beam sputtering(1985)27 cited
- → Practical results of photomask repair using focused ion beam technology(1988)20 cited
- → Sputtered W-Ti Film for X-Ray Mask Absorber(1992)19 cited
- → Fabrication of surface acoustic wave devices by using x-ray lithography(1989)13 cited
- → Proximity effect correction in electron-beam lithography(1981)12 cited
- → High performance very large scale integrated photomask with a silicide film(1986)12 cited
- → <title>Attenuated phase-shifting mask with a single-layer absorptive shifter of CrO, CrON, MoSiO, and MoSiON film</title>(1994)12 cited
- → A Dry Etching Technique Using Electron Beam Resist‐PBS(1980)9 cited
- → Fabrication of 1-Mbit DRAMs By Using X-Ray Lithography(1989)9 cited