Shintaro Aoyama
Gifu University(JP)
Publications by Year
Research Areas
Semiconductor materials and devices, Advancements in Semiconductor Devices and Circuit Design, Integrated Circuits and Semiconductor Failure Analysis, Electronic and Structural Properties of Oxides, Ferroelectric and Negative Capacitance Devices
Most-Cited Works
- → Effects of interfacial roughness on the leakage properties of SrTiO3 thin film capacitors(1995)16 cited
- → Physical and Electrical Effects of the Dep-Anneal-Dep-Anneal (DADA) Process for HfO2 in High K/Metal Gate Stacks(2011)16 cited
- → Periodic oxidation for fabricating titanium oxynitride thin films via atomic layer deposition(2015)14 cited
- → Physical and Electrical Properties of MOCVD Grown HfZrO4 High-k Thin Films Deposited in a Production-Worthy 300 mm Deposition System(2010)5 cited
- → Control of Material Interactions in Advanced High-k Metal Gate Stacks(2006)4 cited
- → Sex differences in brainstem structure volumes in patients with schizophrenia(2023)4 cited
- → Texture Analysis of Si(100) and Si(111) Surfaces Using Autocovariance of AFM Images(1993)1 cited
- → Measurement of Physical Thickness of Native Oxide Using Accurately-Calibrated Atomic Force Microscope(1992)1 cited