Obert R. Wood
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques, Integrated Circuits and Semiconductor Failure Analysis, Advanced X-ray Imaging Techniques, Optical Coatings and Gratings
Most-Cited Works
- → Evaluation of EUV resist materials for use at the 32 nm half-pitch node(2008)107 cited
- → High -gain inner-shell photoionization laser in Cd vapor pumped by soft-x-ray radiation from a laser-produced plasma source(1983)54 cited
- → Vacuum ultraviolet loss in magnesium fluoride films(1984)51 cited
- → Integration of EUV lithography in the fabrication of 22-nm node devices(2009)51 cited
- → The use of EUV lithography to produce demonstration devices(2008)42 cited
- → Influence of ion assistance on the optical properties of MgF_2(1987)42 cited
- → Insertion strategy for EUV lithography(2012)31 cited
- → Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements(2006)30 cited
- → Considerations for a free-electron laser-based extreme-ultraviolet lithography program(2015)26 cited
- → Synchrotron radiation sources and condensers for projection x-ray lithography(1993)26 cited