A. C. Adams
Publications by Year
Research Areas
Semiconductor materials and devices, Thin-Film Transistor Technologies, Silicon Nanostructures and Photoluminescence, Photonic and Optical Devices, Silicon and Solar Cell Technologies
Most-Cited Works
- → Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas(1978)563 cited
- → Spitzer Spectral Observations of the Deep Impact Ejecta(2006)336 cited
- → Characterization of Plasma‐Deposited Silicon Dioxide(1981)144 cited
- → The Deposition of Silicon Dioxide Films at Reduced Pressure(1979)111 cited
- → Thermal Nitridation of Silicon in Ammonia Gas: Composition and Oxidation Resistance of the Resulting Films(1979)110 cited
- → Efficiency of light emission from surface plasmons(1982)101 cited
- → The Chemical Deposition of Boron‐Nitrogen Films(1980)91 cited
- → Gallium Arsenide Surface Film Evaluation by Ellipsometry Its Effect on Schottky Barriers(1973)82 cited
- → Planarization of Phosphorus‐Doped Silicon Dioxide(1981)79 cited
- → Optical properties of low-pressure chemically vapor deposited silicon over the energy range 3.0–6.0 eV(1981)76 cited