J. Foucher
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis, Advanced Surface Polishing Techniques, Semiconductor materials and devices, Electron and X-Ray Spectroscopy Techniques
Most-Cited Works
- → High immunity to threshold voltage variability in undoped ultra-thin FDSOI MOSFETs and its physical understanding(2008)159 cited
- → Tip characterization and surface reconstruction of complex structures with critical dimension atomic force microscopy(2005)71 cited
- → Hydrogen annealing of arrays of planar and vertically stacked Si nanowires(2007)50 cited
- → Hyperbranched Polymers for Photolithographic Applications – Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances(2008)42 cited
- → Plasma impact on 193 nm photoresist linewidth roughness: Role of plasma vacuum ultraviolet light(2009)42 cited
- → Linewidth roughness transfer measured by critical dimension atomic force microscopy during plasma patterning of polysilicon gate transistors(2008)42 cited
- → Optical Fourier transform scatterometry for LER and LWR metrology(2005)41 cited
- → Line edge roughness characterization with a three-dimensional atomic force microscope: Transfer during gate patterning processes(2005)31 cited
- → Chemical topography analyses of silicon gates etched in HBr/Cl2/O2 and HBr/Cl2/O2/CF4 high density plasmas(2003)26 cited
- → 3D-AFM enhancement for CD metrology dedicated to lithography sub-28-nm node requirements(2010)24 cited