Pushkara R. Varanasi
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Nanofabrication and Lithography Techniques, 3D IC and TSV technologies, Semiconductor materials and devices, Advanced Surface Polishing Techniques
Most-Cited Works
- → The Important Role of Heteroaromatics in the Design of Efficient Second-Order Nonlinear Optical Molecules: Theoretical Investigation on Push−Pull Heteroaromatic Stilbenes(1996)280 cited
- → Resist freezing process for double exposure lithography(2008)24 cited
- → Systematic studies on reactive ion etch-induced deformations of organic underlayers(2011)19 cited
- → 45-nm silicon-on-insulator CMOS technology integrating embedded DRAM for high-performance server and ASIC applications(2011)19 cited
- → Reactive ion etching of fluorine containing photoresist(2006)18 cited
- → Dissolution/swelling behavior of cycloolefin polymers in aqueous base(2000)17 cited
- → ArF excimer laser resists based on fluoroalcohol(2006)16 cited
- → Impact of thin resist processes on post-etch LER(2003)13 cited
- → IBM-JSR 193-nm negative tone resist: polymer design, material properties, and lithographic performance(2004)12 cited
- → IBM 193nm Semiconductor Resist: Material Properties, Resist Characteristics and Lithographic Performance.(1999)11 cited