Wei‐Chung Lo
ITRI International(US)Industrial Technology Research Institute(TW)
Publications by Year
Research Areas
3D IC and TSV technologies, Electronic Packaging and Soldering Technologies, Ferroelectric and Negative Capacitance Devices, Advanced Memory and Neural Computing, Additive Manufacturing and 3D Printing Technologies
Most-Cited Works
- → 16.3 A 28nm 384kb 6T-SRAM Computation-in-Memory Macro with 8b Precision for AI Edge Chips(2021)187 cited
- → Synthesis, Crystal Structures, and Magnetic Properties of a Series of Linear Pentanickel(II) Complexes: [Ni5(μ5-tpda)4X2] (X = Cl-, CN-, N3-, NCS-) and [Ni5(μ5-tpda)4(CH3CN)2]- (PF6)2 (tpda2- = the Tripyridyldiamido Dianion)(1998)146 cited
- → Luminescent gold(I) acetylide complexes. Photophysical and photoredox properties and crystal structure of [{Au(CCPh)}2(µ-Ph2PCH2CH2PPh2)](1993)141 cited
- → A 28nm 1Mb Time-Domain Computing-in-Memory 6T-SRAM Macro with a 6.6ns Latency, 1241GOPS and 37.01TOPS/W for 8b-MAC Operations for Edge-AI Devices(2022)127 cited
- → A 22nm 832Kb Hybrid-Domain Floating-Point SRAM In-Memory-Compute Macro with 16.2-70.2TFLOPS/W for High-Accuracy AI-Edge Devices(2023)88 cited