Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films
ACS Applied Materials & Interfaces2015Vol. 7(5), pp. 3323–3328
Citations Over TimeTop 10% of 2015 papers
Michael J. Maher, Charles Rettner, Christopher M. Bates, Gregory Blachut, Matthew C. Carlson, William J. Durand, Christopher J. Ellison, Daniel P. Sanders, Joy Cheng, C. Grant Willson
Abstract
The directed self-assembly (DSA) of lamella-forming poly(styrene-block-trimethylsilylstyrene) (PS-PTMSS, L0=22 nm) was achieved using a combination of tailored top interfaces and lithographically defined patterned substrates. Chemo- and grapho-epitaxy, using hydrogen silsesquioxane (HSQ) based prepatterns, achieved density multiplications up to 6× and trench space subdivisions up to 7×, respectively. These results establish the compatibility of DSA techniques with a high etch contrast, Si-containing BCP that requires a top coat neutral layer to enable orientation.
Related Papers
- → Synthesis of copolymers. I. Copolymers of styrene and of α‐methylstyrene(1972)12 cited
- → Anionic copolymerization of α,ω-dihydroxyoligodimethylsiloxane with organocyclosiloxanes(2008)2 cited
- → Anionic Copolymerization of α-Methylstyrene and 2, 3-Dimethylbutadiene(1972)2 cited
- STUDY ON COPOLYMERIZATION OF D_3~F, D_4(2002)
- Copolymerization of N-vinylformamid and N-vinylcaprolactam(2006)