Acid formation and deprotection reaction by novel sulfonates in a chemical amplification positive photoresist
Citations Over TimeTop 10% of 1990 papers
Abstract
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTAcid formation and deprotection reaction by novel sulfonates in a chemical amplification positive photoresistL. Schlegel, T. Ueno, H. Shiraishi, N. Hayashi, and T. IwayanagiCite this: Chem. Mater. 1990, 2, 3, 299–305Publication Date (Print):May 1, 1990Publication History Published online1 May 2002Published inissue 1 May 1990https://doi.org/10.1021/cm00009a021Request reuse permissionsArticle Views350Altmetric-Citations29LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InReddit PDF (824 KB) Get e-Alertsclose Get e-Alerts
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