Development of low-fluorescence thick photoresist for high-aspect-ratio microstructure in bio-application

Citations Over Time

Abstract

In this study, we propose and evaluate a novel low-auto-fluorescence photoresist (SJI photoresist) for bio-application, e.g., in gene analysis and cell assay. The spin-coated SJI photoresist has a wide thickness range of ten to several hundred micrometers, and photoresist microstructures with an aspect ratio of over 7 and micropatterns of less than 2 μm are successfully fabricated. The emission spectrum intensity of the SJI photoresist is found to be over 80% less than that of the widely used SU-8 photoresist. To evaluate the validity of using the proposed photoresist in bio-application for fluorescence observation, we demonstrate a chromosome extension device composed of the SJI photoresist. The normalized contrast ratio of the SJI photoresist exhibits a 50% improvement over that of the SU-8 photoresist; thus, the SJI photoresist is a versatile tool for bio-application.

Related Papers

• → Tuning of resist slope with hard-baking parameters and release methods of extra hard photoresist for RF MEMS switches(2007)20 cited
• → Development of low-fluorescence thick photoresist for high-aspect-ratio microstructure in bio-application(2015)10 cited
• → Double‐layer resist method to improve descum result when removing negative photoresist(2019)2 cited
• → Dependence of the quality of thick resist structures on resist baking(1998)7 cited
• → <title>Electron Beam Resist And Photoresist Behavior Of Polychrome Positive Resist</title>(1981)