Organometallic route to the chemical vapor deposition of titanium carbide films at exceptionally low temperatures
Citations Over TimeTop 10% of 1987 papers
Abstract
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTOrganometallic route to the chemical vapor deposition of titanium carbide films at exceptionally low temperaturesGregory S. Girolami, James A. Jensen, Deborah M. Pollina, Clare M. Allocca, Alain E. Kaloyeros, and Wendell S. WilliamsCite this: J. Am. Chem. Soc. 1987, 109, 5, 1579–1580Publication Date (Print):March 1, 1987Publication History Published online1 May 2002Published inissue 1 March 1987https://pubs.acs.org/doi/10.1021/ja00239a053https://doi.org/10.1021/ja00239a053research-articleACS PublicationsRequest reuse permissionsArticle Views488Altmetric-Citations81LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose Get e-Alerts
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