The Chemical Vapor Deposition of Nickel Phosphide or Selenide Thin Films from a Single Precursor
Journal of the American Chemical Society2008Vol. 130(8), pp. 2420–2421
Citations Over TimeTop 1% of 2008 papers
Abstract
Nickel phosphide, nickel selenide thin films and their heterostructure (Ni0.85Se/Ni2P) were deposited from a newly synthesized single source precursor {Ni[iPr2P(S)NP(Se)iPr2]2} just by altering the deposition temperature using CVD.
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