Nanoimprint Lithography for Nanophotonics in Silicon
Nano Letters2008Vol. 8(9), pp. 2872–2877
Citations Over TimeTop 15% of 2008 papers
C.M. Bruinink, Matteo Burresi, Meint J. de Boer, F. B. Segerink, Henri Jansen, Erwin Berenschot, David N. Reinhoudt, Jurriaan Huskens, L. Kuipers
Abstract
A novel inverse imprinting procedure for nanolithography is presented which offers a transfer accuracy and feature definition that is comparable to state-of-the-art nanofabrication techniques. We illustrate the fabrication quality of a demanding nanophotonic structure: a photonic crystal waveguide. Local examination using photon scanning tunneling microscopy (PSTM) shows that the resulting nanophotonic structures have excellent guiding properties at wavelengths in the telecommunications range, which indicates a high quality of the local structure and the overall periodicity.
Related Papers
- → Single digit nanofabrication by step-and-repeat nanoimprint lithography(2011)46 cited
- → Soft thermal nanoimprint lithography using a nanocomposite mold(2017)39 cited
- → Magnetic force assisted thermal nanoimprint lithography (MF-TNIL) for cost-effective fabrication of 2D nanosquare array(2020)2 cited
- → Nanofabrication of templates with ultra sharp SiC tips for nanoimprint lithography(2006)1 cited
- → Making Nanophotonics Devices a Reality: Nanofabrication of Advanced Nanophotonic Structures(2013)