Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist
ACS Nano2010Vol. 4(8), pp. 4815–4823
Citations Over TimeTop 10% of 2010 papers
Joy Cheng, Daniel P. Sanders, Hoa D. Truong, Stefan Harrer, Alexander Friz, Steven J. Holmes, Matthew Colburn, William D. Hinsberg
Abstract
We report novel strategies to integrate block copolymer self-assembly with 193 nm water immersion lithography. These strategies employ commercially available positive tone chemically amplified photoresists to spatially encode directing information into precise topographical or chemical prepatterns for the directed self-assembly of block copolymers. Each of these methods exploits the advantageous solubility and thermal properties of polarity-switched positive tone photoresist materials. Precisely registered, sublithographic self-assembled structures are fabricated using these versatile integration schemes which are fully compatible with current optical lithography patterning materials, processes, and tooling.
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