G. Scarel
James Madison University(US)
Publications by Year
Research Areas
Semiconductor materials and devices, Electronic and Structural Properties of Oxides, Thermal Radiation and Cooling Technologies, ZnO doping and properties, Advancements in Semiconductor Devices and Circuit Design
Most-Cited Works
- → Rare Earth Oxide Thin Films(2006)223 cited
- → Ozone-Based Atomic Layer Deposition of Alumina from TMA: Growth, Morphology, and Reaction Mechanism(2006)191 cited
- → Atomic Layer Deposition and Abrupt Wetting Transitions on Nonwoven Polypropylene and Woven Cotton Fabrics(2009)156 cited
- → Atomic-layer deposition of Lu2O3(2004)100 cited
- → Correlation between titania film structure and near ultraviolet optical absorption(1999)99 cited
- → Role of Gas Doping Sequence in Surface Reactions and Dopant Incorporation during Atomic Layer Deposition of Al-Doped ZnO(2009)90 cited
- → Fabrication of GeO2 layers using a divalent Ge precursor(2007)89 cited
- → Surface Polarity Shielding and Hierarchical ZnO Nano-Architectures Produced Using Sequential Hydrothermal Crystal Synthesis and Thin Film Atomic Layer Deposition(2009)88 cited
- → Oxygen diffusion in atomic layer deposited ZrO2 and HfO2 thin films on Si (100)(2004)82 cited
- → Short-range order in ultrathin film titanium dioxide studied by Raman spectroscopy(2000)80 cited