Dail Eom
Seoul National University(KR)
Publications by Year
Research Areas
Semiconductor materials and devices, Copper Interconnects and Reliability, Electronic and Structural Properties of Oxides, Metal and Thin Film Mechanics, GaN-based semiconductor devices and materials
Most-Cited Works
- → Post-Annealing Effects on Fixed Charge and Slow/Fast Interface States of TiN/Al2O3/p-Si Metal–Oxide–Semiconductor Capacitor(2003)53 cited
- → Properties of lanthanum oxide thin films deposited by cyclic chemical vapor deposition using tris(isopropyl-cyclopentadienyl)lanthanum precursor(2006)51 cited
- → Electronic Properties of Atomic-Layer-Deposited Al[sub 2]O[sub 3]/Thermal-Nitrided SiO[sub 2] Stacking Dielectric on 4H SiC(2006)42 cited
- → Property Changes of Aluminum Oxide Thin Films Deposited by Atomic Layer Deposition under Photon Radiation(2006)33 cited
- → Properties of Aluminum Nitride Thin Films Deposited by an Alternate Injection of Trimethylaluminum and Ammonia under Ultraviolet Radiation(2006)32 cited
- → Investigation of interface trap states in TiN/Al2O3/p-Si capacitor by deep level transient spectroscopy(2003)30 cited
- → The Role of the Methyl and Hydroxyl Groups of Low-k Dielectric Films on the Nucleation of Ruthenium by ALD(2008)27 cited
- → Enhanced Nucleation Behavior of Atomic-Layer-Deposited Ru Film on Low-k Dielectrics Afforded by UV-O[sub 3] Treatment(2007)22 cited
- → Deposition Characteristics and Annealing Effect of La[sub 2]O[sub 3] Films Prepared Using La(iPrCp)[sub 3] Precursor(2007)21 cited
- → Thermal Annealing Effects on the Atomic Layer Deposited LaAlO[sub 3] Thin Films on Si Substrate(2008)19 cited