David R. Medeiros
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Nanofabrication and Lithography Techniques, Semiconductor materials and devices, Electron and X-Ray Spectroscopy Techniques, Integrated Circuits and Semiconductor Failure Analysis
Most-Cited Works
- → Hybrid Field-Effect Transistor Based on a Low-Temperature Melt-Processed Channel Layer(2002)177 cited
- → Intercalated Organic−Inorganic Perovskites Stabilized by Fluoroaryl−Aryl Interactions(2002)160 cited
- → [(CH3)3NCH2CH2NH3]SnI4: A Layered Perovskite with Quaternary/Primary Ammonium Dications and Short Interlayer Iodine−Iodine Contacts(2003)71 cited
- → Low-Temperature Melt Processing of Organic−Inorganic Hybrid Films(2002)63 cited
- → Study of resolution limits due to intrinsic bias in chemically amplified photoresists(1999)60 cited
- → Model Studies on the Photochemistry of Phenolic Sulfonate Photoacid Generators(1998)55 cited
- → Extendibility of chemically amplified resists: another brick wall?(2003)40 cited
- → Recent progress in electron-beam resists for advanced mask-making(2001)40 cited
- → Design of Photoresists with Reduced Environmental Impact. 1. Water-Soluble Resists Based on Photo-Cross-Linking of Poly(vinyl alcohol)(1999)38 cited
- → A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist(1997)37 cited