Vu Luong
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques, Advanced X-ray Imaging Techniques, Semiconductor materials and devices, Advancements in Semiconductor Devices and Circuit Design
Most-Cited Works
- → Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography(2017)64 cited
- → Ni-Al Alloys as Alternative EUV Mask Absorber(2018)41 cited
- → Statistical spectroscopy of switching traps in deeply scaled vertical poly-Si channel for 3D memories(2013)33 cited
- → Reducing EUV mask 3D effects by alternative metal absorbers(2017)32 cited
- → Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers(2017)28 cited
- → Novel EUV mask absorber evaluation in support of next-generation EUV imaging(2018)26 cited
- → Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks(2015)24 cited
- → Update on optical material properties for alternative EUV mask absorber materials(2017)17 cited
- → Mask absorber development to enable next-generation EUVL(2019)16 cited
- → Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography(2019)16 cited