A. Blattner

Research Areas

Semiconductor materials and devices, Advancements in Semiconductor Devices and Circuit Design, Advancements in Photolithography Techniques, Copper Interconnects and Reliability, Ferroelectric and Negative Capacitance Devices

Most-Cited Works

• → A 22nm high performance and low-power CMOS technology featuring fully-depleted tri-gate transistors, self-aligned contacts and high density MIM capacitors(2012)750 cited
• → Low-k interconnect stack with metal-insulator-metal capacitors for 22nm high volume manufacturing(2012)49 cited