V. Hoffman
Leibniz Institute for Solid State and Materials Research(DE)
Publications by Year
Research Areas
Copper Interconnects and Reliability, Semiconductor materials and devices, Advanced Surface Polishing Techniques, 3D IC and TSV technologies, Semiconductor materials and interfaces
Most-Cited Works
- → Direct Low-Temperature Nanographene CVD Synthesis over a Dielectric Insulator(2010)336 cited
- → Flavones and New Isoflavone Derivatives from Microorganisms: Isolation and Structure Elucidation(2003)28 cited
- → Ionizer for cluster ion accelerators(1977)17 cited
- → Planarization of aluminum alloy film during high rate sputtering(1987)17 cited
- → Effects of substrate temperature on copper distribution, resistivity, and microstructure in magnetron-sputtered Al-Cu films(1987)13 cited
- → Energy dependence of neutralization in scattering of slow highly charged Ar ions from an Au surface(2000)5 cited
- → Low temperature and low cost planarised aluminiuminterconnect for sub-half micrometre VLSI circuits(1997)5 cited
- → A novel sub-half micron Al-Cu via plug interconnect using low dielectric constant material as inter-level dielectric(1997)4 cited
- → Realistic three-dimensional computations of microwave-ionization curves of hydrogen Rydberg atoms(2002)4 cited
- → A novel low temperature PVD planarized Al-Cu process for high aspect ratio sub-half micron interconnect(2002)4 cited