M. Ferber
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Advanced Measurement and Metrology Techniques, Advanced Surface Polishing Techniques, Surface Roughness and Optical Measurements, Integrated Circuits and Semiconductor Failure Analysis
Most-Cited Works
- → Evaluation of KLA-Tencor LMS IPRO5 beta system for 22nm node registration and overlay applications(2011)7 cited
- → Mask contribution to intra-field wafer overlay(2014)7 cited
- → In-die mask registration for multi-patterning(2013)6 cited
- → Accurate mask registration on tilted lines for 6F2 DRAM manufacturing(2015)3 cited
- → Impact of pellicle on overlay in double patterning lithography(2011)2 cited
- → Actual measurement data obtained on new 65nm generation mask metrology tool set(2005)2 cited
- → Improving registration measurement capability by defining a 2D grid standard using multiple registration measurement tools(2010)1 cited
- → New directions in image placement metrology(2011)1 cited
- → Performance evaluation results on 2Xnm node enabler for mask registration metrology(2010)1 cited
- → Next-generation mask metrology tool(2002)1 cited