Pawitter J. S. Mangat
GlobalFoundries (United States)(US)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques, Integrated Circuits and Semiconductor Failure Analysis, Advanced Surface Polishing Techniques, Semiconductor materials and devices
Most-Cited Works
- → Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography(1999)30 cited
- → Considerations for a free-electron laser-based extreme-ultraviolet lithography program(2015)26 cited
- → Cr absorber etch process for extreme ultraviolet lithography mask fabrication(2001)25 cited
- → Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks(2015)24 cited
- → Layout small-angle rotation and shift for EUV defect mitigation(2012)24 cited
- → Imaging impact of multilayer tuning in EUV masks, experimental validation(2014)23 cited
- → Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images(2014)20 cited
- → Ultrathin photoresists for EUV lithography(1999)19 cited
- → Extreme ultraviolet lithography mask patterning and printability studies with a Ta-based absorber(1999)19 cited
- → Design and method of fabricating phase-shift masks for extreme-ultraviolet lithography by partial etching into the EUV multilayer mirror(2003)18 cited