Seolhye Park
Japan Display (Japan)(JP)
Publications by Year
Research Areas
Plasma Diagnostics and Applications, Metal and Thin Film Mechanics, Semiconductor materials and devices, Industrial Vision Systems and Defect Detection, Laser-induced spectroscopy and plasma
Most-Cited Works
- → 2022 Review of Data-Driven Plasma Science(2023)75 cited
- → Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters(2015)38 cited
- → Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables(2018)36 cited
- → Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma(2021)26 cited
- → Characteristics of a non-Maxwellian electron energy distribution in a low-pressure argon plasma(2014)21 cited
- → Determination of electron energy probability function in low-temperature plasmas from current – Voltage characteristics of two Langmuir probes filtered by Savitzky–Golay and Blackman window methods(2015)18 cited
- → Plasma information-based virtual metrology (PI-VM) and mass production process control(2022)16 cited
- → Predictive control of the plasma processes in the OLED display mass production referring to the discontinuity qualifying PI-VM(2020)16 cited
- → Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth(2019)11 cited
- → Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing(2019)10 cited