Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth
Current Applied Physics2019Vol. 19(10), pp. 1068–1075
Citations Over TimeTop 16% of 2019 papers
Yunchang Jang, Hyun-Joon Roh, Seolhye Park, Sangmin Jeong, Sanywon Ryu, Ji-Won Kwon, Nam‐Kyun Kim, Gon‐Ho Kim
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