Yunchang Jang
Electronics and Telecommunications Research Institute(KR)Samsung (South Korea)(KR)
Publications by Year
Research Areas
Plasma Diagnostics and Applications, Industrial Vision Systems and Defect Detection, Semiconductor materials and devices, Metal and Thin Film Mechanics, Magnetic confinement fusion research
Most-Cited Works
- → Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters(2015)38 cited
- → Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables(2018)36 cited
- → Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma(2021)26 cited
- → Plasma information-based virtual metrology (PI-VM) and mass production process control(2022)16 cited
- → Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth(2019)11 cited
- → Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing(2019)10 cited
- → Ion-neutral collision effect on ion-ion two-stream-instability near sheath-presheath boundary in two-ion-species plasmas(2017)10 cited
- → Observation of runaway electrons in the first EAST ohmic discharge(2007)8 cited
- → Vacuum pump age effects by the exposure to the corrosive gases on the Cr etch rate as observed using optical emission spectroscopy in an Ar/O2/Cl2 mixed plasma(2016)7 cited
- → Investigation of ion-induced etch damages on trench surface of Ge2Sb2Te5 in high density Ar/SF6 plasma(2022)3 cited