Naoya Hayashi
Waseda University(JP)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques, Integrated Circuits and Semiconductor Failure Analysis, Advanced Surface Polishing Techniques, Nanofabrication and Lithography Techniques
Most-Cited Works
- → Performance of EBeyeM for EUV mask inspection(2011)29 cited
- → LER transfer from a mask to wafers(2007)19 cited
- → Development of EB inspection system EBeyeM for EUV mask(2010)18 cited
- → HVM readiness of nanoimprint lithography templates: defects, CD, and overlay(2015)18 cited
- → Formation of Porous Intermetallic Thick Film by Ni-Al Microscopic Reactive Infiltration(2008)18 cited
- → Demonstration of defect free EUV mask for 22nm NAND flash contact layer using electron beam inspection system(2011)17 cited
- → Inter- and Intramolecular Interactions of Polymers as Studied by Fluorescence Spectroscopy. VIII. Absorption and Fluorescence Spectra of Polymer-Bound Anthryl Groups both in Solution and Solid(1978)