HVM readiness of nanoimprint lithography templates: defects, CD, and overlay
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE2015Vol. 9423, pp. 94230D–94230D
Citations Over TimeTop 10% of 2015 papers
Abstract
Performances of the nanoimprint lithography templates were discussed considering the readiness toward the high volume manufacturing of nanoimprint lithography application along with the requirement for the templates and its fabrication process. The current status of the three major performances of the templates was shown.
Related Papers
- → Double patterning for 32nm and below: an update(2008)42 cited
- → Soft thermal nanoimprint lithography using a nanocomposite mold(2017)39 cited
- → Magnetic force assisted thermal nanoimprint lithography (MF-TNIL) for cost-effective fabrication of 2D nanosquare array(2020)2 cited
- → Double patterning overlay budget for 45nm technology node single and double mask approach(2007)9 cited
- → The study of overlay mark in self aligned double patterning and solution(2015)1 cited