Takaharu Nagai
Dai Nippon Printing (Japan)(JP)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Nanofabrication and Lithography Techniques, Electron and X-Ray Spectroscopy Techniques, Block Copolymer Self-Assembly, 3D IC and TSV technologies
Most-Cited Works
- → HVM readiness of nanoimprint lithography templates: defects, CD, and overlay(2015)18 cited
- → Decomposition difficulty analysis for double patterning and the impact on photomask manufacturability(2008)10 cited
- → Development of nanoimprint lithography templates toward high-volume manufacturing(2016)9 cited
- → Characterization of Antisticking Layers for UV Nanoimprint Lithography Molds with Scanning Probe Microscopy(2010)6 cited
- → Pupil plane analysis on AIMS 45-193i for advanced photomasks(2007)5 cited
- → Analysis of diffraction orders including mask topography effects for OPC optimization(2007)4 cited
- → Effects of cleaning on NIL templates: surface roughness, CD, and pattern integrity(2011)3 cited
- → Estimating DPL photomask fabrication load compared with single exposure(2007)2 cited
- → Approach to analyze decomposition impact for photomask fabrication(2007)1 cited
- → Extending resolution limit of EB lithography through material process co-optimization for nanoimprint templates(2025)1 cited