P. A. Seese
Motorola (United States)(US)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques, Semiconductor materials and devices, Welding Techniques and Residual Stresses, Advanced Surface Polishing Techniques
Most-Cited Works
- → Uniform low stress oxynitride films for application as hardmasks on x-ray masks(1997)14 cited
- → <title>Accelerated radiation damage testing of x-ray mask membrane materials</title>(1993)9 cited
- → Modeling of in-plane distortions due to variations in absorber stress(1996)7 cited
- → Electrical linewidth measurements and simulations studying the effects of dose and gap on exposure latitude in x-ray lithography(1995)2 cited
- → <title>Intralevel Hybrid Resist Process With Submicron Capability</title>(1982)2 cited
- → SNR200 chemically amplified resist optimization(1997)2 cited
- → Overlay measurement and analysis of x-ray/optical lithography for mix-and-match device applications(1994)1 cited
- → Temperature gradients during absorber etching and their effect on x-ray mask patterning(1998)1 cited
- → Effect of brightener concentration on the thermal distortion of gold plated x-ray masks(1994)1 cited
- → <title>Electron Beam Resist And Photoresist Behavior Of Polychrome Positive Resist</title>(1981)