Klaus-Dieter Roeth
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Advanced Measurement and Metrology Techniques, Advanced Surface Polishing Techniques, Electron and X-Ray Spectroscopy Techniques, Integrated Circuits and Semiconductor Failure Analysis
Most-Cited Works
- → Registration measurement capability of VISTEC LMS IPRO4 with focus on small features(2008)8 cited
- → Mask contribution to intra-field wafer overlay(2014)7 cited
- → In-die mask registration for multi-patterning(2013)6 cited
- → Experimental test results of pattern placement metrology on photomasks with laser illumination source designed to address double patterning lithography challenges(2009)6 cited
- → Investigation of local registration performance of IMS Nanofabrication’s Multi-Beam Mask Writer(2015)5 cited
- → In-depth overlay contribution analysis of a poly-layer reticle(2010)5 cited
- → In-die registration measurement using novel model-based approach for advanced technology masks(2014)4 cited
- → Advanced mask-to-mask overlay analysis for next generation technology node reticles(2010)4 cited
- → Pellicle-induced distortions on photomasks(1998)4 cited
- → World wide matching of registration metrology tools of various generations(2008)4 cited