Erik Verduijn
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques, Integrated Circuits and Semiconductor Failure Analysis, Advanced X-ray Imaging Techniques, Industrial Vision Systems and Defect Detection
Most-Cited Works
- → BEOL process integration for the 7 nm technology node(2016)35 cited
- → EUV patterning successes and frontiers(2016)25 cited
- → Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks(2015)24 cited
- → Imaging impact of multilayer tuning in EUV masks, experimental validation(2014)23 cited
- → Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images(2014)20 cited
- → Comparison of left and right side line edge roughness in lithography(2016)20 cited
- → Line edge roughness frequency analysis for SAQP process(2016)17 cited
- → Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging(2015)15 cited
- → Deconstructing contact hole CD printing variability in EUV lithography(2014)10 cited
- → EUV vote-taking lithography: crazy... or not?(2018)9 cited