Hoang V. Tran
Ewha Womans University(KR)Sungkyunkwan University(KR)
Publications by Year
Research Areas
Advancements in Photolithography Techniques, Nanofabrication and Lithography Techniques, Electron and X-Ray Spectroscopy Techniques, Electronic Packaging and Soldering Technologies, Semiconductor materials and devices
Most-Cited Works
- → Acid catalyst mobility in resist resins(2002)105 cited
- → Immersion Lithography: Photomask and Wafer-Level Materials(2009)84 cited
- → Study of resolution limits due to intrinsic bias in chemically amplified photoresists(1999)60 cited
- → Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes: Synthesis, Polymerization, and Initial Imaging Results(2002)54 cited
- → Laser‐Raman and Nuclear Magnetic Resonance (NMR) studies on plasma‐sprayed hydroxylapatite coatings: Influence of bioinert bond coats on phase composition and resorption kinetics in simulated body fluid(2003)33 cited
- → 157 nm resist materials: Progress report(2000)29 cited
- → Study of acid transport using IR spectroscopy and SEM(2000)28 cited
- → New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm(2006)25 cited
- → Second generation fluids for 193nm immersion lithography(2006)25 cited
- → Resist materials for 157-nm microlithography: an update(2001)24 cited