David C. Ferranti
Carl Zeiss (United States)(US)
Publications by Year
Research Areas
Electron and X-Ray Spectroscopy Techniques, Integrated Circuits and Semiconductor Failure Analysis, Advancements in Photolithography Techniques, Ion-surface interactions and analysis, Advanced Electron Microscopy Techniques and Applications
Most-Cited Works
- → Rapid and precise scanning helium ion microscope milling of solid-state nanopores for biomolecule detection(2011)197 cited
- → Helium Ion Microscopy (HIM) for the imaging of biological samples at sub-nanometer resolution(2013)157 cited
- → Neon Ion Beam Lithography (NIBL)(2011)74 cited
- → Focused helium ion beam deposited low resistivity cobalt metal lines with 10 nm resolution: implications for advanced circuit editing(2013)67 cited
- → Fabrication and initial characterization of ultrahigh aspect ratio vias in gold using the helium ion microscope(2010)46 cited
- → Performance of multicusp plasma ion source for focused ion beam applications(2000)36 cited
- → Precise nanofabrication with multiple ion beams for advanced circuit edit(2014)17 cited
- → Resolution Limits of Secondary Electron Dopant Contrast in Helium Ion and Scanning Electron Microscopy(2011)13 cited
- → Creating nanohole arrays with the helium ion microscope(2011)13 cited
- → Advanced Nanofabrication using Helium, Neon and Gallium Ion Beams in the Carl Zeiss Orion NanoFab Microscope(2013)13 cited