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Thermal Performance of 3D IC Integration with Through-Silicon Via (TSV)
Journal of Microelectronics and Electronic Packaging2012Vol. 9(2), pp. 97–103
Citations Over TimeTop 23% of 2012 papers
Heng-Chieh Chien, John H. Lau, Fang‐Lin Chao, Ra-Min Tain, Ming-Ji Dai, Sheng-Tsai Wu, Wei‐Chung Lo, Ming‐Jer Kao
Abstract
Thermal performance of 3D IC integration is investigated in this study. Emphasis is placed on the determination of a set of equivalent thermal conductivity equations for Cu-filled TSVs with various TSV diameters, TSV pitches, TSV thicknesses, passivation thicknesses, and microbump pads. Also, the thermal behavior of a TSV cell is examined. Furthermore, 3D heat transfer simulations are adopted to verify the accuracy of the equivalent equations. Finally, the feasibility of these equivalent equations is demonstrated through a simple 3D IC integration structure.
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